REPLICATION APPARATUS AND REPLICATION METHOD

• Main Author: YAMADA YUMIKO
• Format: Patent
• Language: English
• Published: 10.09.2009
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS; PERFORMING OPERATIONS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PROBLEM TO BE SOLVED: To provide a replication apparatus and replication method which are suitable for replicating a plurality of multiple-patterned micro patterns. SOLUTION: The replication apparatus has a heating mechanism which heats pattern boundaries of multiple patterns, which allows the selective crystallization of the pattern boundaries on the surface of a resin film where multiple patterns are duplicated and the replication of the multiple patterns in a state where the cut-assisting treatment is made on the surface to make cutting each of the patterns easier. Thus, a plurality of multiple-patterned micro patterns are appropriately replicated. COPYRIGHT: (C)2009,JPO&INPIT