PROCESSING APPARATUS, WASHING METHOD, AND STORAGE MEDIUM

• Main Authors: HAMADA MASAHITO, HIROTA FUMIO, KOHAMA NORIFUMI
• Format: Patent
• Language: English
• Published: 03.09.2009
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To prevent particles from adhering to a substrate by shortening the time required for the washing process of a rectangular recessed portion into which the substrate is to be inserted in the substrate holding part. SOLUTION: A coating unit is provided with a rectangular recessed portion 3 into which a rectangular substrate G is to be inserted, and a spin chuck S disposed freely rotatably about a vertical axis wherein a washing liquid is supplied along sides of the recessed portion to the rotating spin chuck S from a washing liquid nozzle 61 when the spin chuck S is washed, and then a gas for drying to enhance drying of the washing liquid is supplied along the sides of the recessed portion from a gas nozzle to the spin chuck S after the washing liquid is supplied. COPYRIGHT: (C)2009,JPO&INPIT