SAMPLE MAKING APPARATUS FOR THREE-DIMENSIONAL STRUCTURE OBSERVATION, ELECTRON MICROSCOPE, AND ITS METHOD
PROBLEM TO BE SOLVED: To provide a sample making apparatus for an electron microscope, the electron microscope, and its method for observing the three-dimensional structure of a desired part in a minutely processed semiconductor device. SOLUTION: A dicer is used for processing a sample piece 10, and...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
04.06.2009
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To provide a sample making apparatus for an electron microscope, the electron microscope, and its method for observing the three-dimensional structure of a desired part in a minutely processed semiconductor device. SOLUTION: A dicer is used for processing a sample piece 10, and focused ion beam processing is used for cutting a part to be observed on the sample piece into a protruding shape. The sample piece 10 is fixed to a single-axis full-direction tilting sample holder with the central axis of the protrusion 11 aligned with the axis Z of the tilted sample. TEM images formed of high-angle scattered electrons are used as projection images, and reconstitution is performed. COPYRIGHT: (C)2009,JPO&INPIT |
---|---|
Bibliography: | Application Number: JP20090051471 |