SAMPLE MAKING APPARATUS FOR THREE-DIMENSIONAL STRUCTURE OBSERVATION, ELECTRON MICROSCOPE, AND ITS METHOD

PROBLEM TO BE SOLVED: To provide a sample making apparatus for an electron microscope, the electron microscope, and its method for observing the three-dimensional structure of a desired part in a minutely processed semiconductor device. SOLUTION: A dicer is used for processing a sample piece 10, and...

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Bibliographic Details
Main Authors KAKIBAYASHI HIROSHI, TAKAGUCHI MASANARI, NAKAMURA KUNIYASU, TOKIDA RURIKO
Format Patent
LanguageEnglish
Published 04.06.2009
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Summary:PROBLEM TO BE SOLVED: To provide a sample making apparatus for an electron microscope, the electron microscope, and its method for observing the three-dimensional structure of a desired part in a minutely processed semiconductor device. SOLUTION: A dicer is used for processing a sample piece 10, and focused ion beam processing is used for cutting a part to be observed on the sample piece into a protruding shape. The sample piece 10 is fixed to a single-axis full-direction tilting sample holder with the central axis of the protrusion 11 aligned with the axis Z of the tilted sample. TEM images formed of high-angle scattered electrons are used as projection images, and reconstitution is performed. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20090051471