MONOMOLECULAR FILM OF COPOLYMER OR LAMINATED FILM THEREFROM AND PROCESS FOR PRODUCING THE SAME

• Main Authors: MITANI SEIJU, MIYASHITA TOKUJI, KIM YEJI, MITSUISHI KATAYA
• Format: Patent
• Language: English
• Published: 28.05.2009
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL PROCESSES OF COMPOUNDING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING-UP

PROBLEM TO BE SOLVED: To provide a monomolecular film or a laminated film therefrom having a plurality of monomolecular films that is useful for a resist material or the like. SOLUTION: The monomolecular film or a laminated film therefrom is produced by coating a substrate with a monomolecular film of a copolymer of an acrylic- or styrenic addition-polymerizable monomer comprising a silsesquioxane derivative and an addition polymerizable monomer represented by formula (B) (wherein Rbdenotes hydrogen or a methyl: Z2is -NH-; and n is an integer of 2-20). COPYRIGHT: (C)2009,JPO&INPIT