PROCESSING UNIT, AND METHOD FOR USING THE SAME

PROBLEM TO BE SOLVED: To provide a processing unit capable of improving a throughput by reducing the frequency of cleaning while suppressing production of particles. SOLUTION: The processing unit includes: a vertical and cylindrical processing vessel 4 which can be evacuated; a holding means 12 inse...

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Bibliographic Details
Main Authors INOUE HISASHI, NODERA NOBUTAKE, HASEBE KAZUHIDE, SATO JUN, MATSUNAGA MASANOBU
Format Patent
LanguageEnglish
Published 07.05.2009
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:PROBLEM TO BE SOLVED: To provide a processing unit capable of improving a throughput by reducing the frequency of cleaning while suppressing production of particles. SOLUTION: The processing unit includes: a vertical and cylindrical processing vessel 4 which can be evacuated; a holding means 12 inserted into and detached from the processing vessel while holding an object W to be processed; a heating means 96 provided on the periphery of the processing vessel; a gas supply means 28, 30 and 36 for supplying gas to the processing vessel; a plasma box 66 provided along the longitudinal direction in the processing vessel while having facing electrodes; a high frequency power supply 76 for generating high frequency electric power for plasma generation; and a pair of power supply conductors 78, 80 which connect the facing electrodes to the high frequency power supply and either one of which is grounded. In the processing unit formed so as to apply prescribed treatment to the object to be processed, a switching means 84 for switching the ground side and the hot side of the facing electrodes is provided in the middle of a pair of the power supply conductors. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20070272626