METHOD OF PRODUCING SUBSTRATE FOR EXTREME ULTRAVIOLET LITHOGRAPHY

• Main Authors: RUSSO NIKKI J, HRDINA KENNETH E, WASILEWSKI MICHAEL H
• Format: Patent
• Language: English
• Published: 30.04.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To reduce the deviation of a thermal expansion coefficient in a method of forming a glass substrate for extreme ultraviolet lithography. SOLUTION: This method includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (28) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body. COPYRIGHT: (C)2009,JPO&INPIT