SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

PROBLEM TO BE SOLVED: To suppress diffusion of electric charges accumulated in ONO films onto bit lines or to reduce contact resistance between the bit lines and plug metal. SOLUTION: A semiconductor device has bit lines 30 provided in a semiconductor substrate 10, first ONO films 20 provided on a s...

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Bibliographic Details
Main Authors MURAI HIROSHI, AZUMA MASAHIKO
Format Patent
LanguageEnglish
Published 09.04.2009
Subjects
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