SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
PROBLEM TO BE SOLVED: To suppress diffusion of electric charges accumulated in ONO films onto bit lines or to reduce contact resistance between the bit lines and plug metal. SOLUTION: A semiconductor device has bit lines 30 provided in a semiconductor substrate 10, first ONO films 20 provided on a s...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
09.04.2009
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Subjects | |
Online Access | Get full text |
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