SEMICONDUCTOR MANUFACTURING DEVICE
PROBLEM TO BE SOLVED: To provide a device for etching a layer or sputter-depositing a layer for improving the uniformity. SOLUTION: In a plasma deposition device for depositing a sputtered target material on a substrate, capacitance in an impedance-matching box for an RF coil is varied during the de...
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Format | Patent |
Language | English |
Published |
19.03.2009
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Abstract | PROBLEM TO BE SOLVED: To provide a device for etching a layer or sputter-depositing a layer for improving the uniformity. SOLUTION: In a plasma deposition device for depositing a sputtered target material on a substrate, capacitance in an impedance-matching box for an RF coil is varied during the deposition process in such a manner that heating of the RF coil and the substrate and the film deposition become more uniform according to "time-averaging" of the RF voltage distribution along the RF coil. COPYRIGHT: (C)2009,JPO&INPIT |
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AbstractList | PROBLEM TO BE SOLVED: To provide a device for etching a layer or sputter-depositing a layer for improving the uniformity. SOLUTION: In a plasma deposition device for depositing a sputtered target material on a substrate, capacitance in an impedance-matching box for an RF coil is varied during the deposition process in such a manner that heating of the RF coil and the substrate and the film deposition become more uniform according to "time-averaging" of the RF voltage distribution along the RF coil. COPYRIGHT: (C)2009,JPO&INPIT |
Author | VAN GOGH JAMES FORSTER JOHN C |
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Snippet | PROBLEM TO BE SOLVED: To provide a device for etching a layer or sputter-depositing a layer for improving the uniformity. SOLUTION: In a plasma deposition... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INDUCTANCES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETS METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSFORMERS |
Title | SEMICONDUCTOR MANUFACTURING DEVICE |
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