DEVICE AND METHOD FOR MEASURING PATTERN PITCH AND DEVICE AND METHOD FOR SURFACE INSPECTION

PROBLEM TO BE SOLVED: To provide a pitch measuring device for measuring the pitch of a L/S pattern using a relatively long wavelength light. SOLUTION: The pitch measuring device for measuring the pitch of the L/S pattern (12) includes irradiation systems (1-3) for irradiating the pattern with light...

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Bibliographic Details
Main Author UNO DAISUKE
Format Patent
LanguageEnglish
Published 05.02.2009
Subjects
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a pitch measuring device for measuring the pitch of a L/S pattern using a relatively long wavelength light. SOLUTION: The pitch measuring device for measuring the pitch of the L/S pattern (12) includes irradiation systems (1-3) for irradiating the pattern with light switching at least two wavelength lights, detection systems (4-5) for detecting 0-order diffracted light reflected by the pattern, and a measuring system (6) for measuring the pattern pitch based on the intensity ratio of the intensity of the 0-order diffracted light detected with the first wavelength to the intensity of the 0-order diffracted light detected with the second wavelength by the detection system. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20080156223