MANUFACTURING METHOD OF PATTERNED MEDIUM

PROBLEM TO BE SOLVED: To provide a manufacturing method of a patterned medium which can efficiently fill magnetic substance deep into fine pores, even if a sputtering method is employed for filling the magnetic substance into the fine pores of a porous layer, has very few impurities and has a magnet...

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Bibliographic Details
Main Authors TANAKA TERUMITSU, YAMAMOTO SETSUO, KURISU SHINKI
Format Patent
LanguageEnglish
Published 20.11.2008
Subjects
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide a manufacturing method of a patterned medium which can efficiently fill magnetic substance deep into fine pores, even if a sputtering method is employed for filling the magnetic substance into the fine pores of a porous layer, has very few impurities and has a magnetic substance layer of a high coercive force. SOLUTION: In the method of manufacturing the patterned medium including a substrate, the porous layer formed on the substrate and having a plurality of fine pores approximately vertical to the substrate surface, and the magnetic substance filled in the fine pores by the sputtering method, ion radiation is carried out with respect to the vicinity of the fine pores when filling the fine pores with the magnetic substance by the sputtering method to promote migration of sputter atoms. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20070125316