DEFECT INSPECTION APPARATUS, DEFECT INSPECTION PROGRAM, FIGURE DRAWING APPARATUS, AND FIGURE DRAWING SYSTEM

PROBLEM TO BE SOLVED: To provide a technique which can detect a defect in run-length data to be used for drawing of a figure before the execution of drawing, with a simple structure. SOLUTION: Input CAD data D1 and run-length data D2 obtained by performing a RIP process on the input CAD data D1 are...

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Bibliographic Details
Main Authors YAMADA AKIRA, KITAMURA KIYOSHI, NAKAI KAZUHIRO, FURUKAWA ITARU
Format Patent
LanguageEnglish
Published 13.11.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a technique which can detect a defect in run-length data to be used for drawing of a figure before the execution of drawing, with a simple structure. SOLUTION: Input CAD data D1 and run-length data D2 obtained by performing a RIP process on the input CAD data D1 are acquired. Then a predetermined conversion process is performed on at least one of the input CAD data D1 and the run-length data D2 to make the data formats of both data comparable, and then both data are compared with each other to detect an area having a difference as a defect area in the run-length data D2. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20070276775