DEPOSITION SOURCE AND SPUTTERING APPARATUS
PROBLEM TO BE SOLVED: To provide a deposition source in which use efficiency is high and a nodule is not formed. SOLUTION: A plurality of magnetic circuits 251, 252are arranged on the rear face of a target 22 and zero points p of the perpendicular components of the magnetic fields are annularly form...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
23.10.2008
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Subjects | |
Online Access | Get full text |
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