METHOD OF MANUFACTURING CRYSTAL OSCILLATOR

PROBLEM TO BE SOLVED: To provide a crystal oscillator manufacturing method in which a crystal oscillator is easily small-sized, processing steps are reduced and productivity is improved, further, to provide an inexpensive crystal oscillator manufacturing method in which a processing time is short an...

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Bibliographic Details
Main Authors HORIUCHI SADAO, IKEDA TOMOO
Format Patent
LanguageEnglish
Published 25.09.2008
Subjects
BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
RESONATORS
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Summary:PROBLEM TO BE SOLVED: To provide a crystal oscillator manufacturing method in which a crystal oscillator is easily small-sized, processing steps are reduced and productivity is improved, further, to provide an inexpensive crystal oscillator manufacturing method in which a processing time is short and which is inexpensive without requiring any expensive processing devices, and moreover, to provide a method of manufacturing a crystal oscillator which has both high reliability and high precision, improved in oscillation property, by achieving a convex shape constituted of a smooth curved surface. SOLUTION: A method of manufacturing a crystal oscillator using thickness-slip vibration includes the steps of: forming a thin film pattern having a convex surface on a crystal substrate by jetting fine particles from a nozzle; forming a crystal oscillation plate having a convex surface on at least one side by etching the crystal substrate while utilizing the thin film pattern as a mask; and forming an electrode at a predetermined position on the crystal oscillation plate. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20070067676