PATTERN DIMENSION MEASURING DEVICE

PROBLEM TO BE SOLVED: To provide a pattern dimension measuring device capable of reducing the occurrence of errors and suppressing an increase of measuring time. SOLUTION: An image processing section 51 determines a position relationship between a region within guarantee or a region out of guarantee...

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Bibliographic Details
Main Author FUJISAKI NOBUO
Format Patent
LanguageEnglish
Published 28.08.2008
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a pattern dimension measuring device capable of reducing the occurrence of errors and suppressing an increase of measuring time. SOLUTION: An image processing section 51 determines a position relationship between a region within guarantee or a region out of guarantee set beforehand to a reference image considering positional deviation caused by the movement of "a substrate 1" or "an imaging optical system 3 and an imaging device 4," and a feature pattern or a measuring region set to a control device 5. A control section 52 carries out processing for restraining the feature pattern or the measuring region from being set as the region out of guarantee according to the result of determination. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20070034776