VAPOR DEPOSITION SYSTEM, VAPOR DEPOSITION METHOD, ORGANIC LIGHT EMITTING DEVICE AND DISPLAY

• Main Authors: UETAKE YUKI, SAITO AKIRA, KANO HIROSHI
• Format: Patent
• Language: English
• Published: 31.07.2008
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To uniformly vapor-deposit a vapor deposition material such as an organic material in which control to heat is important at stable performance over a long period. SOLUTION: The vapor deposition system includes: a material holding part 11 packed with a vapor deposition material and heating the same 11; an opening 12 scattering the vapor deposition material 10 evaporated from the material holding part 11 toward the member 20 to be vapor-deposited; and a high temperature body 13 arranged between the material holding part 11 and the opening 12 and heated to a temperature T1 higher than the temperature T2 of the vapor deposition material 10 heated by the material holding part 11. COPYRIGHT: (C)2008,JPO&INPIT