LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS

PROBLEM TO BE SOLVED: To correct a focus position in the short axial direction of rectangular beams that readily correspond to the positional fluctuations of a laser irradiation portion of a semiconductor film in a laser anneal that uses a solid-state laser. SOLUTION: By the use of a condenser lens...

Full description

Saved in:
Bibliographic Details
Main Authors MASAKI MIYUKI, MORITA MASARU, YOSHINOUCHI ATSUSHI, KAWAGUCHI NORIHITO, NISHIDA KENICHIRO, KAWAKAMI RYUSUKE
Format Patent
LanguageEnglish
Published 10.07.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To correct a focus position in the short axial direction of rectangular beams that readily correspond to the positional fluctuations of a laser irradiation portion of a semiconductor film in a laser anneal that uses a solid-state laser. SOLUTION: By the use of a condenser lens for a short axis 29 for condensing incident light in the short-axis direction and a projection lens 30 for projecting outgoing light from the condenser lens for the short axis 29 on a surface of a semiconductor film 3, laser beam 1 is condensed in the short-axis direction of the rectangular beams on a surface of the semiconductor film 3; the positional fluctuations in the vertical direction to the semiconductor film 3, in the laser irradiation portion of the semiconductor film 3, is detected; and the condenser lens for the short axis 29 is shifted to an optical axial direction, based on this detection value. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060347055