STAGE STRUCTURE FOR SURFACE TREATMENT

PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION: First and second suction holes 56, 66 are provided on a stage body 20X. A cover member 23 is put on the surface of the stage body 20X to seal...

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Bibliographic Details
Main Author SAITO NAOMICHI
Format Patent
LanguageEnglish
Published 03.07.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Abstract PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION: First and second suction holes 56, 66 are provided on a stage body 20X. A cover member 23 is put on the surface of the stage body 20X to seal the first suction hole 56. A vacuum suction force is introduced into the first suction hole 56 to suck the cover member 23 onto the stage body 20X. The cover member 23 has a third suction hole 67 continuing to the second suction hole 66. The workpiece W is placed on the cover member 23, and then, the vacuum suction force is introduced into the second suction hole 66, up to the third suction hole 67, thereby allowing the cover member 23 to suck the workpiece W. COPYRIGHT: (C)2008,JPO&INPIT
AbstractList PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION: First and second suction holes 56, 66 are provided on a stage body 20X. A cover member 23 is put on the surface of the stage body 20X to seal the first suction hole 56. A vacuum suction force is introduced into the first suction hole 56 to suck the cover member 23 onto the stage body 20X. The cover member 23 has a third suction hole 67 continuing to the second suction hole 66. The workpiece W is placed on the cover member 23, and then, the vacuum suction force is introduced into the second suction hole 66, up to the third suction hole 67, thereby allowing the cover member 23 to suck the workpiece W. COPYRIGHT: (C)2008,JPO&INPIT
Author SAITO NAOMICHI
Author_xml – fullname: SAITO NAOMICHI
BookMark eNrjYmDJy89L5WRQDQ5xdHdVCA4JCnUOCQ1yVXDzD1IIDg1yc3R2VQgJcnUM8XX1C-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBhaGpsYmJiaOxkQpAgDhvSWl
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID JP2008153444A
GroupedDBID EVB
ID FETCH-epo_espacenet_JP2008153444A3
IEDL.DBID EVB
IngestDate Fri Jul 19 11:52:30 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_JP2008153444A3
Notes Application Number: JP20060340026
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080703&DB=EPODOC&CC=JP&NR=2008153444A
ParticipantIDs epo_espacenet_JP2008153444A
PublicationCentury 2000
PublicationDate 20080703
PublicationDateYYYYMMDD 2008-07-03
PublicationDate_xml – month: 07
  year: 2008
  text: 20080703
  day: 03
PublicationDecade 2000
PublicationYear 2008
RelatedCompanies SEKISUI CHEM CO LTD
RelatedCompanies_xml – name: SEKISUI CHEM CO LTD
Score 2.7069252
Snippet PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION:...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title STAGE STRUCTURE FOR SURFACE TREATMENT
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080703&DB=EPODOC&locale=&CC=JP&NR=2008153444A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_mFPVNpzKdShHtW3Eu6ddDkS5tHYVtpR-yt9GsKYgwh6v473upq-5pbyGBywf55e6S310A7nXrSfDSHiDELaFRvqCahZpas6ltSFqhUVAZnDyeGKOMhjN91oL3JhamzhP6XSdHREQtEO9VfV6v_i-xvJpbuX7kb1j18Rykjqc23rEld7DqDR0_mnpTpjLmhJE6ies2BDel1N2DfbSjTQkH_3Uow1JW2zolOIGDCMUtq1NoiWUHjljz9VoHDsebF28sbsC3PoOHJHVffCVJ44xJsoKCDpySZHHgMl9JY99NZWL-c7gL_JSNNOxv_je7eRhtjY1cQBvdftEFhea6XeZWvxCmoILbnIiSWBztgZwUZMAvobdD0NXO1h4c__IeTK1PrqFdfX6JG1SuFb-tF-UHZVV47g
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gGvFNUaPix2J0b4tAu68HYka3iZPBMorhjVAoiTFBIjP--14nU554a9rk-pH-enft764Ad6bTkGLuNhHijjSomFLDQU1tuNS1FK3QmlEVnBz3rM6QRiNzVIL3IhYmzxP6nSdHRERNEe9Zfl4v_y-x_JxbuXoQb1j18Rjylq8X3rGjdrDut1tB0vf7TGesFSV6L83bENyUUm8HdtHGthUcgte2CktZbuqU8BD2EhS3yI6gJBdVqLDi67Uq7MfrF28srsG3Oob7AfeeAm3A0yFTZAUNHThtMExDjwUaTwOPq8T8J3AbBpx1DOxv_De7cZRsjI2cQhndfnkGGp2Y7nzi1GfSllQKVxA5J45Ae2BCZqQpzqG2RdDF1tYbqHR43B13n3svNTj45UDYRp1cQjn7_JJXqGgzcZ0v0A878nvh
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=STAGE+STRUCTURE+FOR+SURFACE+TREATMENT&rft.inventor=SAITO+NAOMICHI&rft.date=2008-07-03&rft.externalDBID=A&rft.externalDocID=JP2008153444A