STAGE STRUCTURE FOR SURFACE TREATMENT

PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION: First and second suction holes 56, 66 are provided on a stage body 20X. A cover member 23 is put on the surface of the stage body 20X to seal...

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Bibliographic Details
Main Author SAITO NAOMICHI
Format Patent
LanguageEnglish
Published 03.07.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a stage structure for surface treatment, enabling a stage to suck a workpiece via a cover member put on the stage. SOLUTION: First and second suction holes 56, 66 are provided on a stage body 20X. A cover member 23 is put on the surface of the stage body 20X to seal the first suction hole 56. A vacuum suction force is introduced into the first suction hole 56 to suck the cover member 23 onto the stage body 20X. The cover member 23 has a third suction hole 67 continuing to the second suction hole 66. The workpiece W is placed on the cover member 23, and then, the vacuum suction force is introduced into the second suction hole 66, up to the third suction hole 67, thereby allowing the cover member 23 to suck the workpiece W. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060340026