VACUUM VAPOR DEPOSITION APPARATUS AND ITS OPERATING METHOD

• Main Authors: SHIN HIROTO, ISHIGAMI TATSUSHI
• Format: Patent
• Language: English
• Published: 26.06.2008
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus capable of preventing deposition of a substance scattered by evaporation on a pole piece, and preventing a situation in which any excessive residue is left behind in a vacuum chamber, in particular, around the pole piece from being realized. SOLUTION: The vacuum vapor deposition apparatus comprises a pole piece cover 15 for shielding a pole piece 51 from a substance scattered by evaporation, and a driving means for turning the pole piece cover 15 around a predetermined supporting point and performing the translational drive, and further comprises a control means for performing the drive control of the driving means so that the substance deposited on the pole piece cover 15 is scraped off from the pole piece cover 15 by colliding the pole piece cover 15 against a hit surface of a hit body 20 by the predetermined number of times. COPYRIGHT: (C)2008,JPO&INPIT