EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

• Main Author: BESSHO KAZUNORI
• Format: Patent
• Language: English
• Published: 08.05.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source device, of which an exchange work of a discharge part, a convergent mirror or the like is easy, and a down time of a device can be shortened. SOLUTION: A lid member 21 covering an opening of a vessel 10 in free attachment to and detachment from the vessel 10 is provided. A discharge member 18 composed of a first electrode 11, a second electrode 12, an insulating material 13, or the like, an EUV convergent mirror 2, and a foil trap 3 are fitted to the lid member 21 to make up a discharge part convergent mirror unit 19. Then, at the state of the discharge part convergent mirror unit 19, after a light axis of the discharge member 18 is made consistent with that of the convergent mirror 2, and a position of the convergent mirror 2 in the light axis direction is adjusted against the discharge member 18, a convergent mirror side of the discharge part convergent mirror unit 19 is directed toward the opening of the vessel 10 (a chamber), and the convergent mirror 2 and the foil trap 3 are inserted into the chamber 10 to fix the lid member 21 to the vessel 10. COPYRIGHT: (C)2008,JPO&INPIT