METHOD OF IMPROVING PRECISION IN OPTICAL MEASUREMENT

PROBLEM TO BE SOLVED: To provide a method and a system for changing optical characteristics in an adjustable resist usable for manufacturing an electron device such as an integrated circuit. SOLUTION: The method and the system for improving precision in measurement using optical measurement are prov...

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Bibliographic Details
Main Authors WILLIS JAMES E, KLEKOTKA JAMES E
Format Patent
LanguageEnglish
Published 24.04.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a method and a system for changing optical characteristics in an adjustable resist usable for manufacturing an electron device such as an integrated circuit. SOLUTION: The method and the system for improving precision in measurement using optical measurement are provided. Further the method and the system using an adjustable resist layer are provided. The adjustable resist layer provides first and second sets of optical characteristics before and after exposure, respectively. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20070245156