PLASMA GENERATING DEVICE AND WORK PROCESSING DEVICE

PROBLEM TO BE SOLVED: To enable to turn on plasma from all the plasma generating nozzles in a short time without carrying out a complicated control. SOLUTION: Photo acceptance units 101a to 101h receive plume P emitted from plasma generating nozzles 31 arranged in the vicinities. A stub control part...

Full description

Saved in:
Bibliographic Details
Main Authors MATSUUCHI HIDETAKA, MASUDA SHIGERU, MANKAWA HIROSHI
Format Patent
LanguageEnglish
Published 27.03.2008
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PLASMA TECHNIQUE
PREVENTION OF FOULING IN GENERAL
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To enable to turn on plasma from all the plasma generating nozzles in a short time without carrying out a complicated control. SOLUTION: Photo acceptance units 101a to 101h receive plume P emitted from plasma generating nozzles 31 arranged in the vicinities. A stub control part 902 makes a stub 701 continuously changed, until it is detected by the photo acceptance units 101a to 101h that the plume P is emitted from all the plasma generating nozzles 31. On the other hand, the stub control part 902 keeps stubs 701 to 703 to rise and set up to a prescribed rising and setting length in which impedance matching can be made between a waveguide 10 and the plasma generating nozzles 31, after it is detected by the photo acceptance units 101a to 101h that the plume P is emitted from all the plasma generating nozzles 31. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060246795