MANUFACTURING METHOD OF MAGNETIC HEAD SLIDER

PROBLEM TO BE SOLVED: To solve such a problem that when dry etching is performed after grinding a row bar or a floating plane of a magnetic head slider, conductive smear caused by plastic flow in grinding can be eliminated, while a damage region is formed at an end plane of an intermediate layer of...

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Bibliographic Details
Main Authors YASUI HIROTO, SEKI TAKATERU, WATANABE KATSURO, MIYATA KAZUFUMI, MATSUZAKI TETSUYA
Format Patent
LanguageEnglish
Published 06.03.2008
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Summary:PROBLEM TO BE SOLVED: To solve such a problem that when dry etching is performed after grinding a row bar or a floating plane of a magnetic head slider, conductive smear caused by plastic flow in grinding can be eliminated, while a damage region is formed at an end plane of an intermediate layer of a magneto-resistance effect film, and output is reduced or dielectric strength is reduced. SOLUTION: Cleaning by ion beam irradiation is performed to eliminate conductive smear after grinding a row bar or a floating plane of a magnetic head slider 10, oxygen exposure is performed to recover a damage region 14a formed at an end plane of an intermediate layer 14 of a magneto-resistance effect film 5 by ion beam irradiation , after that, floating plane protection films 7, 8 are formed, successively, rail processing is performed. When the above processing is performed for the row bar, the row bar is cut and separated into individual head slider. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060228862