EXTREME ULTRAVIOLET OPTICAL SOURCE EQUIPMENT

• Main Authors: KOMORI HIROSHI, GEORGE SOUMAGNE, UENO YOSHIFUMI
• Format: Patent
• Language: English
• Published: 24.01.2008
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To efficiently discharge charge particles of ion or the like discharged from plasma by magnetic field operation, and to suppress second-order creation of contaminant, in extreme ultraviolet optical source equipment of a laser generation plasma system. SOLUTION: The extreme ultraviolet optical source equipment includes: a target nozzle 4 for supplying a target material 11; a laser oscillator 1 for generating plasma by irradiating the target material 11 supplied by the target nozzle 4 with laser beams; an EUV condensing mirror 5 for condensing extreme ultraviolet light radiated from the plasma; and electromagnets 6 and 7 with openings 6a and 7a formed in accordance with the shape of lines of magnetic flux 12 of a magnetic field, and the electromagnet 6 adapted to form the magnetic field in a position irradiating the target material 11 with the laser beams. COPYRIGHT: (C)2008,JPO&INPIT