RAW MATERIAL FOR CERIUM-BASED ABRASIVE, METHOD FOR PRODUCING CERIUM-BASED ABRASIVE AND CERIUM-BASED ABRASIVE

PROBLEM TO BE SOLVED: To obtain a raw material for a cerium-based abrasive suitable for producing a cerium-based abrasive for making a polished surface having excellent surface precision. SOLUTION: The raw material for a cerium-based abrasive comprises at least one of a rare earth carbonate and a ra...

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Bibliographic Details
Main Author KOBAYASHI DAISAKU
Format Patent
LanguageEnglish
Published 24.01.2008
Subjects
ADHESIVES
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
POLISHES
POLISHING
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To obtain a raw material for a cerium-based abrasive suitable for producing a cerium-based abrasive for making a polished surface having excellent surface precision. SOLUTION: The raw material for a cerium-based abrasive comprises at least one of a rare earth carbonate and a rare earth oxide, at least one of a rare earth monooxycarbonate and a rare earth hydroxycarbonate and cerium being a rare earth element as a main component. The raw material has the ratio (B/A), of the peak intensity (B) of a larger peak (b) of the maximum peak (b1) emerging in the range of 2θ of 15.9±1.0° and the maximum peak (b2) emerging in the range of 2θ of 17.8±1.0° to the peak intensity (A) of a larger peak (a) of the maximum peak (a1) emerging in the range of 2θ of 10.4±1.0° and the maximum peak (a2) emerging in the range of 2θ of 28.3±0.7°, of 0.01-2.0 in powder X-ray diffraction measurement (2θ=5-40°) under a fixed condition. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060187113