ULTRASONIC CLEANING DEVICE

PROBLEM TO BE SOLVED: To prevent cleaning failure by preventing contaminants from generating owing to deterioration of a support for a material to be cleaned because of ultrasonic wave for cleaning. SOLUTION: In an ultrasonic cleaning device 25 wherein the support (wafer boat 48) for supporting the...

Full description

Saved in:
Bibliographic Details
Main Author EJIMA KAZUYOSHI
Format Patent
LanguageEnglish
Published 10.01.2008
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PERFORMING OPERATIONS
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To prevent cleaning failure by preventing contaminants from generating owing to deterioration of a support for a material to be cleaned because of ultrasonic wave for cleaning. SOLUTION: In an ultrasonic cleaning device 25 wherein the support (wafer boat 48) for supporting the material (wafer 2) to be cleaned is arranged inside a cleaning tub 41 containing an ultrasonic oscillation means 42, cover bodies 64 and 65 for attenuating the ultrasonic wave are installed to cover the support (wafer boat 48). COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060175555