LITHOGRAPHIC EQUIPMENT AND METHOD OF MANUFACTURING DEVICE

• Main Authors: KAMIDI RAMIDIN I, TSO YIN TIM, TOUSAIN ROB
• Format: Patent
• Language: English
• Published: 06.12.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; HOLOGRAPHY; MATERIALS THEREFOR; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

PROBLEM TO BE SOLVED: To provide lithographic equipment capable of improving the throughput without sacrificing the overlay performance. SOLUTION: Lithography equipment has a movable object and a control system for controlling the position of the movable object. The control system comprises a position measuring system for measuring the position of the movable object, a comparing unit for generating a servo error signal by subtracting a position signal which shows the actual position of the movable object from a reference signal, a control unit for generating a first control signal based on the servo error signal, a feedforward unit for generating a feedforward signal based on the reference signal, an adding unit for generating a second control signal by adding the first control signal and the feedforward signal, and an actuator for making the movable object operate. The gain of the feedforward unit depends on the position of the movable object. COPYRIGHT: (C)2008,JPO&INPIT