PLASMA GENERATOR, AND WORK PROCESSOR

• Main Authors: MATSUUCHI HIDETAKA, HAYASHI HIROSHI, MANKAWA HIROSHI
• Format: Patent
• Language: English
• Published: 15.11.2007
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a plasma generator capable of outputting stable plasma for a long time. SOLUTION: A microphone 39 measures a sound of plasma emitted from a plasma generating nozzle 31. A bypass current adjusting unit 901 calculates the integrated value of the last quarter cycle of one cycle of the waveform of the sound measured by the microphone 39. The bypass current adjusting unit 901 lowers a bypass current when the calculated integrated value is larger than an upper limit reference data, and raises the bypass current when the calculated integrated value is smaller than a lower limit reference data. This enables emission of stable plasma for a long time. COPYRIGHT: (C)2008,JPO&INPIT