FABRIC FOR MASK HAVING MOISTURE RETENTIVITY, AND HYGIENIC MASK USING IT

PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric hav...

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Bibliographic Details
Main Author SAWA EI
Format Patent
LanguageEnglish
Published 01.11.2007
Subjects
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