FABRIC FOR MASK HAVING MOISTURE RETENTIVITY, AND HYGIENIC MASK USING IT
PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric hav...
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Main Author | |
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Format | Patent |
Language | English |
Published |
01.11.2007
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Subjects | |
Online Access | Get full text |
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