FABRIC FOR MASK HAVING MOISTURE RETENTIVITY, AND HYGIENIC MASK USING IT

PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric hav...

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Bibliographic Details
Main Author SAWA EI
Format Patent
LanguageEnglish
Published 01.11.2007
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Summary:PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric having moisture retentivity. As the woven or non-woven fabric having moisture retentivity, a woven or non-woven fabric being formed of a natural fiber is preferably used. The fabric for mask preferably has a supporting layer as well. Also, the fabric for mask preferably has air permeability expressed by the number of flagyls of 150 cm/second or higher. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060111086