FABRIC FOR MASK HAVING MOISTURE RETENTIVITY, AND HYGIENIC MASK USING IT
PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric hav...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
01.11.2007
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To provide a fabric for a mask having a high moisture retentivity in the fabric for mask using a polytetrafluoroethylene porous film. SOLUTION: This fabric for a mask has a laminated structure, and has the polytetrafluoroethylene porous film, and a woven or non-woven fabric having moisture retentivity. As the woven or non-woven fabric having moisture retentivity, a woven or non-woven fabric being formed of a natural fiber is preferably used. The fabric for mask preferably has a supporting layer as well. Also, the fabric for mask preferably has air permeability expressed by the number of flagyls of 150 cm/second or higher. COPYRIGHT: (C)2008,JPO&INPIT |
---|---|
Bibliography: | Application Number: JP20060111086 |