COATING COMPOSITION FOR USE TOGETHER WITH OVERCOATED PHOTORESIST

PROBLEM TO BE SOLVED: To provide organic coating compositions including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. SOLUTION: Preferred organic coat...

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Bibliographic Details
Main Authors WAYTON GERALD B, ZAMPINI ANTHONY
Format Patent
LanguageEnglish
Published 13.09.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide organic coating compositions including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. SOLUTION: Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxyl moieties. COPYRIGHT: (C)2007,JPO&INPIT
Bibliography:Application Number: JP20070046770