LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Author: VAN DEN BIGGELAAR PETRUS MARINUS CHRISTIANUS MARIA
• Format: Patent
• Language: English
• Published: 23.08.2007
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that performs feedforward a control so as to appropriately compensate for the disturbance of a stage. SOLUTION: A lithographic apparatus includes a first control system CS1 to control a first physical quantity in the lithographic apparatus. A parameter in the first control system CS1 is dependent on the value of another physical quantity in the lithographic apparatus. The parameter may be included in a feedforward path. An input of the feedforward path may be connected to a second control system CS2 which controls a second physical quantity in the lithographic apparatus. The feedforward path can provide a feedforward signal to the first control system CS1, depending on the signal in the second control system CS2. This physical quantity may be the second physical quantity. COPYRIGHT: (C)2007,JPO&INPIT