SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To uniformly activate MOS transistors in an ESD protection element with a multi-finger structure composed of a plurality of MOS transistors. SOLUTION: A plurality of gate electrodes 12 are arranged in parallel so that source regions 11S and drain regions 11D are formed on a sub...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
10.05.2007
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To uniformly activate MOS transistors in an ESD protection element with a multi-finger structure composed of a plurality of MOS transistors. SOLUTION: A plurality of gate electrodes 12 are arranged in parallel so that source regions 11S and drain regions 11D are formed on a substrate on both sides of the gate electrodes 12. On the source regions 11S, there are formed a plurality of source contacts 13, and a plurality of drain contacts 14 are formed on the drain regions 11D. Between the gate electrode 12 and the plurality of drain contacts 14, a salicide block 15 for preventing silicide formation on the drain region 11D is formed, and a substrate contact 16 is formed on the semiconductor substrate that is electrically connected to the semiconductor substrate. Further, the salicide block 15 is formed such that its length in a channel length direction becomes the longer, the farther it gets from the substrate contact 16. COPYRIGHT: (C)2007,JPO&INPIT |
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Bibliography: | Application Number: JP20050308629 |