METHOD FOR REMOVING THIN FILM OF ELECTROCONDUCTIVE METAL OXIDE, AND APPARATUS THEREFOR

• Main Authors: DAIKU HIROYUKI, KAMIKAWA KENJI, INOUE TETSUYA
• Format: Patent
• Language: English
• Published: 26.04.2007
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS

PROBLEM TO BE SOLVED: To provide a method for removing a thin film of an electroconductive metal oxide without leaving scratch or deformation by stress, and an apparatus therefor. SOLUTION: This removing apparatus comprises: a cylindrical electrode body 13 which is arranged above the thin film 12 of the electroconductive metal oxide formed on the surface of a substrate 11, and has electrodes 13b and 13c respectively in an inner peripheral surface side and outer peripheral surface side of an insulator 13a having a cylindrical shape; and a power source 14 for applying voltage to the electrode 13b in the inner peripheral surface side and the electrode 13c in the outer peripheral surface side so that they can be a positive electrode and a negative electrode respectively. The removing method comprises the steps of: introducing an electrolytic solution 19 into the cylindrical electrode body 13; and reducing the electroconductive metal oxide of the thin film 12 on the substrate 11 in the introduced electrolytic solution 19 to remove the thin film 12. Thereby, the thin film of the electroconductive metal oxide even formed in the end of the substrate can be efficiently removed without forming scratch or deformation by stress, and an expensive functional glass substrate or the like can be recycled. COPYRIGHT: (C)2007,JPO&INPIT