PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

• Main Authors: TAKAYANAGI TAKASHI, SASAKI YOSHIHARU, WAKATA YUICHI
• Format: Patent
• Language: English
• Published: 29.03.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS

PROBLEM TO BE SOLVED: To provide a photosensitive composition or the like which has a nearly uniform sensitivity distribution to exposure light having a wavelength of 400-410 nm, is not affected by variation in exposure wavelength during laser exposure, excels in pattern reproducibility, suppresses variation in pattern profile, and can be handled in a daylight environment. SOLUTION: The photosensitive composition contains a binder, a polymerizable compound, a photopolymerization initiator, a sensitizer and a heat crosslinking agent, wherein the sensitizer contains two or more sensitizers each having an absorption maximum at a wavelength of 340-500 nm. The photosensitive composition preferably has a maximum value of spectral sensitivity in a wavelength region of 380-420 nm, and it is preferable that smallest exposure amount S capable of forming a pattern in a region of 400-410 nm is ≤210 mJ/cm2and the maximum value Smax of smallest exposure amount and the minimum value Smin of smallest exposure amount in the region satisfy formula: Smax/Smnin≤1.2. COPYRIGHT: (C)2007,JPO&INPIT