SUBSTRATE TREATMENT EQUIPMENT

• Main Authors: TAKEBAYASHI YUJI, TOYODA KAZUYUKI, YASHIMA SHINJI, NOMURA RUI
• Format: Patent
• Language: English
• Published: 01.03.2007
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide substrate treatment equipment which can prevent or suppress the mixing of high-frequency noise from an electrode to which high-frequency power is applied into a heating means. SOLUTION: The substrate treatment equipment comprises a treatment tube 2 for storing a substrate; the heating means 4 which is located outside the treatment tube 2 and is arranged as to surround the treatment tube 2; gas supplying means 13 for supplying a desired treatment gas into the treatment tube 2; the electrode which is located between the treatment tube 2 and the heating means 4, and is constructed from a first electrode 6 to which high-frequency power is applied and a second electrode 7 which is grounded; and another treatment tube 21 located between the heating means 4 and the electrode. The treatment tube 21 is formed of a material selected among a group of a metal, a high dielectric material, and ceramic. COPYRIGHT: (C)2007,JPO&INPIT