MEASURING SYSTEM OF DOUBLE-SIDED PROFILE OF SUBSTRATE, AND MEASURING METHOD FOR THE DOUBLE-SIDED PROFILE OF SUBSTRATE

• Main Authors: KITA YASUYUKI, UEDA KATSUNOBU, TANAKA TATSUICHI, AKIYAMA SHIGETAKA, AKIYAMA TAKANOBU
• Format: Patent
• Language: English
• Published: 22.02.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR

PROBLEM TO BE SOLVED: To provide a measuring system of double-sided profile of a substrate and a measuring method for double-sided profile of a substrate, capable of simultaneously and accurately measuring the double-sided profile of the front and the back. SOLUTION: The measuring mainframe 1 has a reference plane 4 of a vertical surface plate 3 arranged at one end on a metal made bed 2 almost vertically, a holding mechanism 5 for holding a substrate P to be measured, nearly in parallel with it and a displacement meter scanning column 9. The displacement meter scanning column 9 comprises the first air slide for loading the first (second) displacement meter(s) and the second air slide for loading the third displacement meter, and moves along a pair of V-groove 10 in the horizontal axis direction. Also, the first (second) air slide(s) move in the vertical axis directions. By scanning the first (second) displacement meter(s), surface profile of one surface of the substrate plate P to be measured is measured and at the same time, by scanning the third displacement meter, the surface profile of the other side of the plate is measured. COPYRIGHT: (C)2007,JPO&INPIT