POSITION DETECTION DEVICE, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING MICRO DEVICE

PROBLEM TO BE SOLVED: To provide a position detection device capable of accurately taking a measurement of the alignment mark position. SOLUTION: The device has an illumination optical system for bright-field illumination or dark-field illumination of the alignment mark WM provided for a substrate W...

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Bibliographic Details
Main Authors MIZUKI SAORI, NAGAYAMA TADASHI
Format Patent
LanguageEnglish
Published 15.02.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a position detection device capable of accurately taking a measurement of the alignment mark position. SOLUTION: The device has an illumination optical system for bright-field illumination or dark-field illumination of the alignment mark WM provided for a substrate W, and an imaging optical system for condensing a luminous flux which is reflected by the alignment mark WM, imaging it, and detects the position of the substrate W. In this case, the device is provided with a switching means 35 which switches illumination by the illumination optical system to the bright-field illumination or to the dark-field illumination according to at least one of the pattern structure and the pattern pitch of the alignment mark WM. COPYRIGHT: (C)2007,JPO&INPIT
Bibliography:Application Number: JP20050227479