INSPECTION APPARATUS AND INSPECTION METHOD OF OBSERVATORY OPTICAL SYSTEM, POSITION DETECTION DEVICE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING MICRODEVICE

• Main Author: MIZUKI SAORI
• Format: Patent
• Language: English
• Published: 15.02.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To provide an inspection apparatus of an observatory optical system, with which coma aberrations or vignetting can be detected accurately from an image of phase patterns by dark-field illumination. SOLUTION: The inspection apparatus of the observatory optical system has an illu...