INSPECTION APPARATUS AND INSPECTION METHOD OF OBSERVATORY OPTICAL SYSTEM, POSITION DETECTION DEVICE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING MICRODEVICE

• Main Author: MIZUKI SAORI
• Format: Patent
• Language: English
• Published: 15.02.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To provide an inspection apparatus of an observatory optical system, with which coma aberrations or vignetting can be detected accurately from an image of phase patterns by dark-field illumination. SOLUTION: The inspection apparatus of the observatory optical system has an illumination optical system for dark field illumination of a test subject W, and an imaging optical system which condenses a beam of light from the test subject W and forms an image of the test subject W. In this case, it is also provided with photoelectric detection means 16 and 17, which subjects the phase patterns WM formed on the test subject W to dark field illumination by the illumination optical system, and a detection means 35, which detects coma aberration or eclipse of the observatory optical system from the asymmetry of output obtained from the photoelectric detection means 16 and 17. COPYRIGHT: (C)2007,JPO&INPIT