LITHOGRAPHIC PROJECTION APPARATUS
PROBLEM TO BE SOLVED: To provide a support means simple in structure, low in cost and usable in a vacuum to support a balance mass for nullifying vibration caused by reaction force when moving a substrate table in a lithographic projection apparatus. SOLUTION: The balance mass of the lithographic pr...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
15.02.2007
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a support means simple in structure, low in cost and usable in a vacuum to support a balance mass for nullifying vibration caused by reaction force when moving a substrate table in a lithographic projection apparatus. SOLUTION: The balance mass of the lithographic projection apparatus is supported on a base frame by at least one flexible support element mechanically mounted to the balance mass and the base frame and having at least two pivot points. Since the support element has at least two pivot points, the support means hardly shows resistance to the horizontal motion of the balance mass BM to allow the balance mass BM to freely move in a horizontal direction, and is usable in the vacuum because of not using an air bearing. COPYRIGHT: (C)2007,JPO&INPIT |
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Bibliography: | Application Number: JP20060300304 |