ANTIREFLECTION FILM, METHOD FOR PRODUCING SAME, POLARIZING PLATE, AND DISPLAY DEVICE

• Main Authors: IKEDA TOSHIYUKI, MAEJIMA KATSUMI
• Format: Patent
• Language: English
• Published: 01.02.2007
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; GENERAL PROCESSES OF COMPOUNDING; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

PROBLEM TO BE SOLVED: To provide an antireflection film having improved scratch resistance and adhesion, a method for producing the same, and a polarizing plate and a display device using the antireflection film and excellent in visibility. SOLUTION: In the method for producing the antireflection film having at least a low-refractive-index layer on a transparent base film directly or by way of another layer, the low-refractive-index layer is formed by applying a coating composition for a low-refractive-index layer prepared by adding (3) an acid to a composition containing (1) an organosilicon compound represented by the formula (1): Si(OR)4or a hydrolysate thereof or a polycondensate thereof and (2) hollow silica-based fine particles comprising an outer shell layer and a porous or hollow interior portion, wherein R is an alkyl group, preferably a 1-4C alkyl group. COPYRIGHT: (C)2007,JPO&INPIT