BURIED HETEROSTRUCTURE DEVICE HAVING INCORPORATED WAVEGUIDE GRATING PRODUCED BY SINGLE STEP MOCVD
PROBLEM TO BE SOLVED: To provide an optoelectronic device comprising a growth surface, a growth mask, an optical waveguide core mesa, and a cladding layer, which allow a buried heterostructure to be formed easily, and incorporate such a structure. SOLUTION: An optoelectronic device comprises a growt...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
25.01.2007
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide an optoelectronic device comprising a growth surface, a growth mask, an optical waveguide core mesa, and a cladding layer, which allow a buried heterostructure to be formed easily, and incorporate such a structure. SOLUTION: An optoelectronic device comprises a growth surface, a growth mask, an optical waveguide core mesa, and a cladding layer. The growth mask 132 is located on a semiconductor surface, and defines an elongate growth window having a periodic grating profile. The optical waveguide core mesa 140 is located in the growth window, and has a trapezoidal cross-sectional shape. The cladding layer 160 covers the optical waveguide core mesa, and extends over at least part of the growth mask. Such a device is produced by providing a wafer comprising a growth surface, growing an optical waveguide core mesa on the growth surface by means of micro-selective area growth at a first temperature, and covering the optical waveguide core mesa with a cladding material at a second temperature that is lower than the first temperature. COPYRIGHT: (C)2007,JPO&INPIT |
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Bibliography: | Application Number: JP20060166847 |