ANALYSIS SUPPORTING METHOD FOR SUBSTRATE INSPECTION RESULT, ANALYSIS SUPPORTING APPARATUS FOR SUBSTRATE INSPECTION RESULT EMPLOYING METHOD, AND PROGRAM

• Main Authors: KOBARI AKIRA, YAMASHITA HIROMI, NAKADA GOJI, SHIBUYA KAZUHISA, TAKAGI RYOSUKE, TANIGAMI MASANOBU
• Format: Patent
• Language: English
• Published: 11.01.2007
• Subjects: CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; PRINTED CIRCUITS

PROBLEM TO BE SOLVED: To provide an analysis supporting method by which analysis processing can be easily and accurately executed when a person executes the analysis on whether or not a substrate manufacturing process has a drawback or design has a problem. SOLUTION: An analysis processing apparatus 1 is connected to inspection apparatuses 2A-2E for processes of a substrate manufacturing line 100 and to a design data server 3 via a LAN line 4. Image data used for inspection and additional information thereof are supplied from the inspection apparatuses 2A-2E, and are stored in an internal database. The apparatus 1 reads images from the predetermined inspection apparatus in response to a designation operation of a user, and is supplied with corresponding design data from the server 3. The apparatus 1 matches the magnification factor and direction of a design drawing based on the design data with those of an image to create a composite image in which the both are overlapped, and display the composite image on a monitor 10. COPYRIGHT: (C)2007,JPO&INPIT