ADJUSTMENT METHOD

PROBLEM TO BE SOLVED: To optimize an environment control parameter for controlling environment in an exposing device precisely and quickly. SOLUTION: By using a simplex method or a GA, processing is repeated, where at least one of information on exposure precision and that on an environment inside t...

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Bibliographic Details
Main Authors SUKEGAWA AYAKO, KAGAMI ETSUNARI
Format Patent
LanguageEnglish
Published 07.12.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To optimize an environment control parameter for controlling environment in an exposing device precisely and quickly. SOLUTION: By using a simplex method or a GA, processing is repeated, where at least one of information on exposure precision and that on an environment inside the device affecting exposure precision is monitored while the setting value of a group of environment control parameters for controlling the environment inside the exposing device is changed, and the value of an evaluation function with the exposure precision as an evaluation index is calculated based on the monitored result. In step 407, the setting value of the group of environment control parameters of which the value of the evaluation function is satisfactory is decided as the desired value of a group of currently-operated environment control parameters of the device. COPYRIGHT: (C)2007,JPO&INPIT
Bibliography:Application Number: JP20050150364