INSPECTION DEVICE, INSPECTION METHOD, AND METHOD OF MANUFACTURING PATTERN SUBSTRATE USING THEM

PROBLEM TO BE SOLVED: To provide an inspection device and method enabling accurate inspection, and a method of manufacturing a pattern substrate using them. SOLUTION: This inspection device is equipped with a polygon mirror 5 having a rotary reflecting surface for reflecting a light beam from a ligh...

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Bibliographic Details
Main Authors MATSUMOTO MASANORI, OHARA SHINOBU, YONEZAWA MAKOTO
Format Patent
LanguageEnglish
Published 16.11.2006
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide an inspection device and method enabling accurate inspection, and a method of manufacturing a pattern substrate using them. SOLUTION: This inspection device is equipped with a polygon mirror 5 having a rotary reflecting surface for reflecting a light beam from a light source 1, for scanning the light beam by rotating the propagation axis of an outgoing beam together with the time; a collimator optical system 7 having a spherical surface concave mirror 8 and a correction lens 9, for changing the outgoing beam emitted from the polygon mirror 5 into a light beam parallel to the optical axis, whose distance from the optical axis is changed together with the time; a cylindrical lens 21 provided along the scanning direction of the light beam, for collecting scattered light scattered by a sample 10; a bundle fiber 23 arranged so that the scattered light emitted from the cylindrical lens 21 enters; and a PMT 24 for detecting the scattered light emitted from the bundle fiber 23. COPYRIGHT: (C)2007,JPO&INPIT
Bibliography:Application Number: JP20050135827