MASK CHECKING METHOD AND MASK CHECKING SYSTEM

PROBLEM TO BE SOLVED: To provide a mask checking method and a mask checking system by which a mask setting mistake is prevented. SOLUTION: The mask checking system is composed of: a mask information management database 1 for indicating a mask to be used for manufacturing; a mask to which an identifi...

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Bibliographic Details
Main Authors KOYAMA KYOHEI, SEO JUNYA, ARAI HIROYUKI
Format Patent
LanguageEnglish
Published 14.09.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide a mask checking method and a mask checking system by which a mask setting mistake is prevented. SOLUTION: The mask checking system is composed of: a mask information management database 1 for indicating a mask to be used for manufacturing; a mask to which an identification code is imparted; a reading device 5 for reading the identification code; and a checking device 2 for checking on the read identification code information against the indicated mask. The mask is automatically checked on, thereby preventing defective products from being manufactured owing to the mistake of mask setting. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20050057025