COMPOUND SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a compound semiconductor device for achieving a stable operation at a high voltage for a long time by suppressing an increase in a leakage current of a gate electrode. SOLUTION: In the gate electrode 101 formed by applying Schottky junction onto a compound semiconduc...

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Bibliographic Details
Main Authors KANEMURA MASAHITO, NISHI SHINKO
Format Patent
LanguageEnglish
Published 27.07.2006
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Summary:PROBLEM TO BE SOLVED: To provide a compound semiconductor device for achieving a stable operation at a high voltage for a long time by suppressing an increase in a leakage current of a gate electrode. SOLUTION: In the gate electrode 101 formed by applying Schottky junction onto a compound semiconductor layer 100, the increase in the leakage current of the gate electrode is suppressed by providing a diffusion preventing layer made of TixW1-xN (0<x<1) for suppressing the metal of a low resistance metal layer 42 into the compound semiconductor layer 100, between an Ni layer 41 forming a Schottky barrier to the compound semiconductor layer 100 and the low resistance metal layer 42. COPYRIGHT: (C)2006,JPO&NCIPI
Bibliography:Application Number: JP20050007966