PLASMA PROCESSING APPARATUS

• Main Authors: WATANABE AKIZO, HIROSHIMA MITSURU, OKUNE MITSUHIRO, SUZUKI HIROYUKI, MIYAKE KIYOO
• Format: Patent
• Language: English
• Published: 13.07.2006
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which enables the observation of the state of a processed object under a plasma treatment on real time. SOLUTION: A dry etching apparatus 11 includes; a vacuum container 12 where the processed object 1 is arranged at the bottom wall side of an internal space 15; a coil 36 equipped with a conductor arranged above the outside of the vacuum container 12, and equipped with a conductor arranged so that a clearance may be formed as seen by a plane view for generating a plasma; a top wall 16 for closing the upper part of the internal space 15 and having a transparent part 30 at the position corresponding to the clearance between the conductors of the coil 36 as seen in a plane view; and a camera 45 which is arranged above the coil 36 and which can store some processed object at least in the field of view through the clearance between the conductors of the coil 36 and the transparent part 30 of the top wall 16. COPYRIGHT: (C)2006,JPO&NCIPI