METHOD FOR FORMING METAL OXIDE FILM

• Main Authors: YAMADA SATOSHI, IWATA MASUMITSU, NISHIMOTO TOMONORI, TOYAMA JO, KONDO TAKAHARU, HAYASHI SUSUMU, SONODA YUICHI, MIYAMOTO YUSUKE
• Format: Patent
• Language: English
• Published: 22.06.2006
• Subjects: APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To swiftly detect the abnormality of an electric circuit in the production of a metal oxide film by electrodeposition, and to prevent the reduction of yield. SOLUTION: In the film formation method where a d.c. source is connected to each of a plurality of metal electrodes arranged in parallel, and a metal oxide film is electrodeposited on a beltlike electrically conductive counter substrate, the electric potential of each metal electrode to the electric potential of a correcting electrode located on the beltlike substrate is measured, further, in the case the difference in the electric potential between the adjoining metal electrodes exceeds a prescribed value, the electric circuit on the side whose electric potential is higher is shielded from the whole circuit. Alternatively, after the shielding, an electrode in a spare system is energized. COPYRIGHT: (C)2006,JPO&NCIPI